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SGIA Digital Expo 2005 Features Phoseon`s UV Light

Recently, Phoseon Technology announced that it will showcase, at the SGIA Digital Expo in Phoenix, AZ, a new high intensity semiconductor-based ultraviolet light system. The exposition will take place on December 8th -10th 2005. The system - known as the RX Starfire ? is based on the company`s revolutionary SLM (Semiconductor Light Matrix) technology.

The RX Starfire system is designed to complement Phoseon`s growing RX family of wide area UV light systems to serve larger format UV Ink Jet applications. In addition to ink curing, Phoseon`s RX products are used in applications such as adhesive curing and the curing of paints and coatings.

The RX Starfire continues the key advantages of Phoseon`s SLM UV light sources when compared to standard lamp-based UV systems, providing pure UV light output with low heat generation, significant reductions in power usage, and significantly longer lifetimes. The product`s physical package is far more environmentally attractive and cost effective than that of mercury-based light sources, providing an efficient system that is very easy for OEMs to integrate and operate.